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Physics of Microfabrication: Front End Processing >> Content Detail



Lecture Notes



Lecture Notes

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This section includes audio lectures that were recorded specifically for OpenCourseWare. Lectures are presented by topic, and not necessarily by date.

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Lec #TOPICSAUDIO
1Introduction to 6.774

CMOS Process Flow
2Crystal Growth, Wafer Fabrication, and Basic Properties of Si Wafers
3Crystal Growth, Wafer Fabrication, and Basic Properties of Si Wafers (cont.)

Wafer Cleaning and Gettering
(RM - 16K)
4Wafer Cleaning and Gettering (cont.)(RM - 16K)
5Wafer Cleaning and Gettering - Contamination Measurement Techniques

Oxidation and the Si/SiO2 Interface - Uses of Oxides and CV Measurement Techniques
(RM - 16K)
6Oxidation and the Si/SiO2 Interface: Deal/Grove Model, Thin Oxide Models(RM - 16K)
7Oxidation and the Si/SiO2 Interface: 2D Effects, Doping Effects, Point Defects(RM - 16K)
8Dopant Diffusion - Need for Abrupt Profiles, Fick's Laws, Simple Analytic(RM - 16K)
9Dopant Diffusion - Numerical Techniques in Diffusion, E Field Effects(RM - 16K)
10Dopant Diffusion - Fermi Level Effects, I and V Assisted Diffusion(RM - 16K)
11Dopant Diffusion - Review Atomic Scale Models, Profile Measurement Techniques(RM - 16K)
12Ion Implantation and Annealing - Analytic Models and Monte Carlo(RM - 16K)
13Ion Implantation and Annealing - Physics of E Loss, Damage, Introduction to TED(RM - 16K)
14Transient Enhanced Diffusion (TED) - +1 Model, (311) Defects and TED Introduction(RM - 16K)
15Transient Enhanced Diffusion (TED) - Simulation Examples, TED Calculations, RSCE in detail(RM - 16K)
16The SUPREM IV Process Simulator(RM - 16K)
17Thin Film Deposition and Epitaxy - Introduction to CVD, Si Epitaxial Growth(RM - 16K)
18Thin Film Deposition and Epitaxy - CVD Examples and PVD(RM - 16K)
19Thin Film Deposition and Epitaxy - Modeling Topography of Deposition(RM - 16K)
20Etching - Introduction(RM - 16K)
21Etching - Poly Gate Etching, Stringers, Modeling of Etching(RM - 16K)
22Silicides, Device Contacts, Novel Gate Materials(RM - 16K)
23Growth and Processing of Strained Si/SiGe and Stress Effects on Devices(RM - 16K)
24-26Report Presentations

 








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